Reviewers
|
Book & Monographs
|
Conference
|
Contact Us
SEARCH
|
My Profile
|
My Shopping Cart
|
Logout
Home
Publication Ethics
Open Access Policy
Guidelines
Journals
Computer Science and Artificial Intelligence
Engineering and Sciences
Materials Engineering
Mathematics and Statistics
Oceanography
All Journals
Submit a Manuscript
Author Login
Author Registration
Forget Password
Journal Menu
Journal Home
Editorial Board
Guidelines for Authors
Indexing
Contents
Contents
Subscribe
Publication Ethics and Publication Malpractice Statement
Content
Volume 3 (2022)
Volume 3,
Pg 1 - 20 (January-Dec 2022)
Volume 2 (2010)
Volume 2, Issue 1 & 2
Pg 1 - 147 (September 2010)
Volume 1 (2010)
Volume 1, Issue 2
Pg 79 - 109 (June 2010)
Volume 1, Issue 1
Pg 1 - 78 (March 2010)
Categories
Computer Science and Artificial Intelligence
Engineering and Sciences
Materials Engineering
Mathematics and Statistics
Oceanography
All Journals
Far East Journal of Mechanical Engineering and Physics
Far East Journal of Mechanical Engineering and Physics
Volume 1, Issue 2, Pages 99 - 109 (June 2010)
SCALAR RELATIVISTIC AND IMPURITY EFFECTS ON NANO-InSb MIS CAPACITOR CHARACTERISTICS
H. Simchi, M. Mehmandoost, Sh. Mohammadnejad, E. Mahmoodzadeh and M. H. Saani
Abstract:
In this paper, we modeled a nano-InSb metal-insulator-semiconductor (MIS) capacitor with one dimensional Schrödinger-Poisson coupled equation in both nonrelativistic and scalar relativistic cases. We showed, the charge density is peaked near the middle of the channel in nonrelativistic case (called size quantization) and it disappears as we consider the scalar relativistic effects although we do not change the size. Consequently the electron distribution looks more classical for scalar relativistic case. Also we showed the existence of an effective coulomb (or parabola) like potential which can be created by an impurity, cleaning process of surface, insulator layer deposition, or misalignment in lithography process of gate, confines the electrons at surface and it means that the device always remains in the OFF regime. Therefore one may conclude that, in manufacturing nano-InSb MIS capacitor the cleaning process of InSb surface, growth process of insulator layer and lithography process of gate, are very important and critical processes. Also one should attend to classical behavior in characterization process of device although the size of device is in nanometer scale.
Keywords and phrases:
nano-InSb MIS capacitor, Schrödinger-Poisson coupled equation, scalar relativistic effect, electron distribution, Fermi energy level.
Number of Downloads:
179 |
Number of Views:
464
Previous
P-ISSN: 2229-4511
Journal Stats
Publication count:
14
Citation count (Google Scholar):
0
h10-index (Google Scholar):
0
h-index (Google Scholar):
0
Downloads :
3133
Views:
11098
Downloads/publish articles:
223.79
Citations (Google Scholar)/publish articles:
0
This website is best viewed at 1024x768 or higher resolution with Microsoft Internet Explorer 6 or newer.